Publications associated to project

Project no. 17-08389S of the Czech Science Foundation
Advanced preparation of catalytically active oxides on metal supports using combination of plasma sputtering and chemical methods
M. Cada    (2017-2019)

Total: 7
M. Dvořáková, R. Perekrestov, P. Kšírová, J. Balabánová, K. Jirátová, J. Maixner, P. Topka, J. Rathouský, M. Koštejn, M. Čada, Z. Hubička, F. Kovanda
Preparation of cobalt oxide catalysts on stainless steel wire mesh by combination of magnetron sputtering and electrochemical deposition
Catalysis Today 334 (2019) 13-23.

R. Hippler, M. Čada, V. Straňák, C. A. Helm, Z. Hubička
Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
Journal of Applied Physics 125 (2019) 013301(1)-013301(7).

K. Jirátová, R. Perekrestov, M. Dvořáková, J. Balabánová, P. Topka, M. Koštejn, J. Olejníček, M. Čada, Z. Hubička, F. Kovanda
Cobalt Oxide Catalysts in the Form of Thin Films Prepared by Magnetron Sputtering on Stainless-Steel Meshes: Performance in Ethanol Oxidation
Catalysts 9 (2019) 806-824.

J. Olejníček, J. Šmíd, R. Perekrestov, P. Kšírová, J. Rathouský, M. Kohout, M. Dvořáková, Š. Kment, K. Jurek, M. Čada, Z. Hubička
Co3O4 thin films prepared by hollow cathode discharge
Surface & Coatings Technology 366 (2019) 303-310.

R. Perekrestov, A. Spesyvyi, J. Maixner, K. Mašek, O. Leiko, I. Khalakhan, J. Maňák, P. Kšírová, Z. Hubička, M. Čada
The comparative study of electrical, optical and catalytic properties of Co3O4 thin nanocrystalline films prepared by reactive high-power impulse and radio frequency magnetron sputtering.
Thin Solid Films 686 (2019) 137427(1)-137427(9).

V. Straňák, Z. Hubička, M. Čada, R. Bogdanowicz, H. Wulff, C. A. Helm, R. Hippler
Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering
Journal of Physics D: Applied Physics 51 (2018) 095205(1)-095205(12).

R. Hippler, M. Čada, V. Straňák, Z. Hubička, C.A. Helm
Pressure dependence of Ar2+, ArTi+, and Ti2+ dimer formation in a magnetron sputtering discharge
Journal of Physics D: Applied Physics 50 (2017) 445205(1)-445205(8).